| ChampiAn
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| Easy
to maintain data |
| Browse
all experiments through experimental factors and wafers |
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| Permanently
stores all input data |
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| Share
all data with other engineers |
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| Flexible
to accept user's experimental conditions |
| Create
experiments for |
patterned oxide wafers |
|
tungsten, sti, copper wafers |
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blanket oxide, tungsten, sti, copper wafers |
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| Load
Data Automatically or Manually |
| Automatic
loading of thickness data files from |
KLA Tencor F5, Uv1050 |
|
Thermowave Optiprobe |
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Nanometrics NanoSpec/AFT |
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| Blanket
thickness data from |
KLA Tencor F5 |
|
CDE Resmap |
| User-friendly
interface to enter data manually |
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| Calculation
and Analysis with no effort |
Automatic
calculation
of critical CMP metrics |
Removal Rate, Amount Removed for thickness data |
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Step Height Reduction for stepheight data |
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Average, Standard deviation, Range |
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Planarization Length, Blanket Removal Rate for Oxide wafers |
| Analysis
results in plots or tabular form |
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| Effective
Data Exchange |
| Export
and Import Experiment data between ChampiAn
users |
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| Print
graphs |
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| Easy
to extract values from scan data (Scan Analyzer) |
| Read
scan data files from |
HRP P series |
| Extract
stepheight |
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| Save
and apply the repetitive condition to extract values |
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